In-situ etch-depth control better than 5 nm with reflectance anisotropy spectroscopy (RAS) equipment during reactive ion etching (RIE): A technical RAS application
| Author: | Christoph DoeringORCiD, Johannes Strassner, Henning FouckhardtORCiD |
|---|---|
| URL: | https://aip.scitation.org/doi/full/10.1063/1.5099526 |
| DOI: | https://doi.org/10.1063/1.5099526 |
| ISSN: | 2158-3226 |
| Journal: | AIP Advances |
| Publisher: | AIP |
| Document Type: | Research Article |
| Language: | English |
| Year of first Publication: | 2019 |
| Release Date: | 2022/05/13 |
| Faculties / Organisational entities: | RPTU in Kaiserslautern / Fachbereich Physik |
| Open access state: | Gold Open-Access |
| Publication funding: | DFG-Fonds |
| RPTU: | Kaiserslautern |
| Research funding: | DFG |
| Created at the RPTU: | Yes |